콘텐츠 본문
논문 해외 국제전문학술지(SCI급) GROWTH PROPERTIES OF CARBON NANOWALLS ON GLASS SUBSTRATES BY A MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2014-05
- 저자명 정연호공동(참여),김성일,최원석
- 학술지명 JAPANESE JOURNAL OF APPLIED PHYSICS
- 발행처명 INST PURE APPLIED PHYSICS
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 3
논문 초록 (Abstract)
In this study, we investigated the low-temperature growth process of carbon nanowalls (CNWs). A microwave plasma-enhanced chemical vapor deposition (PECVD) system was used to grow CNWs on Si and glass substrates using methane (CH4) and hydrogen (H2) gases. CNWs were synthesized at a substrate temperature of 500 °C, and their growth properties depending on their growth time were examined. The vertical and surficial conditions of the grown CNWs depending on the growth temperature were characterized via field-emission scanning electron microscopy (FE-SEM), and the Raman spectroscopy measurements showed structural variations. The optical properties of the CNWs that were synthesized on the glass substrate were analyzed using UV–vis spectroscopy, and it was found that the light transmittance was affected by the form and shape of the CNWs. Energy dispersive spectroscopy (EDS) showed that the CNWs consisted solely of carbon.
