콘텐츠 본문
논문 해외 국제전문학술지(SCI급) EFFECTS OF PLASMA TREATMENT ON CARBON NANOWALLS GROWN BY MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2016-05
- 저자명 CHOI, WS (CHOI, WON SEOK),KANG, H (KANG, HYUNIL),JUNG, YH (JUNG, YONG HO),JOUNG, YH (JOUNG, YEUN-HO)공동(참여),CHOI, YK (CHOI, YOUNG-KWAN)
- 학술지명 JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
- 발행처명 AMER SCIENTIFIC PUBLISHERS
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 5
논문 초록 (Abstract)
In this study, the effects of post-plasma treatment on synthesized carbon nanowalls (CNWs) grown with a microwave were investigated. CNWs were synthesized by microwave plasma enhanced chemical vapor deposition (PECVD), employing a mixture of CH4 and H2 gases. The plasma treatment was done in different plasma environments (O2 and H2) but under the same condition of synthesized CNWs. Raman spectroscopy, field emission scanning electron microscopy (FE-SEM), energy dispersive X-ray spectroscopy (EDS), and fourier transform infrared spectroscopy (FT-IR) were used to analyze the effects of the post-plasma treatment on the synthesized CNWs. After the H2 post-plasma treatment, no significant changes in the appearance and characteristics of the CNWs were observed. After the O2 post-plasma treatment, on the other hand, the CNWs were etched at a rate of 18.05 nm/sec. The Raman analysis confirmed, however, that the structural changes in the CNWs caused by the O2 post-plasma treatment were insignificant.
