콘텐츠 본문
논문 해외 국제전문학술지(SCI급) PROPERTIES OF CARBON NANOWALLS GROWN ON GLASS SUBSTRATES ACCORDING TO THE ETCHING MICROWAVE POWER
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2016-10
- 저자명 CHOI, WS (CHOI, WON SEOK),SHIN, SK (SHIN, SEUNG KWON),PARK, JK (PARK, JONG KUG),KIM, JH (KIM, JUNG HYUN),KIM, HJ (KIM, HYUNG JIN),KIM, H (KIM, HYUNGCHUL),KANG, H (KANG, HYUNIL),JOUNG, YH (JOUNG, YEUN-HO)공동(참여)
- 학술지명 JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
- 발행처명 AMER SCIENTIFIC PUBLISHERS
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 8
논문 초록 (Abstract)
In this paper, we investigated the effect of microwave power, during the plasma-etching of grown carbon nanowalls (CNWs), on the properties of the CNWs. A microwave plasma enhanced chemical vapor deposition (PECVD) system was used to grow CNWs on a glass substrate using a mixture of CH4 and H2 gases. The grown CNWs were plasma-treated under the oxygen ambient (O2) with different degrees of microwave power (500∼1000 W, in steps of 100 W). After the post-plasma treatment, the cross-sectional and planar images of the CNWs were examined via field-emission scanning electron microscopy (FE-SEM) according to the microwave power of the plasma treatment. Then the structural characteristics of the CNWs were analyzed via Raman spectroscopy, and the changes in the light transmittance according to the degrees of the O2 plasma treatment power were analyzed using UV-visible spectroscopy.
